Jin, Ming; Xu, Haoran; Hong, Hong; Malval, Jean-Pierre; Zhang, Yuan; Ren, Aimin; Wan, Decheng; Pu, Hongting published an article in 2013, the title of the article was Design of D-π-A type photoacid generators for high efficiency excitation at 405 nm and 800 nm.Product Details of 53136-21-3 And the article contains the following content:
New sulfonium salts with diphenylamino asym. substituted stilbene as a D-π-A conjugated system have been synthesized. The resulting photoacid generators exhibit a highly efficient acid photogeneration process by either one-photon 405 nm or two-photon 800 nm excitation. The experimental process involved the reaction of Benzyl(4-bromophenyl)sulfane(cas: 53136-21-3).Product Details of 53136-21-3
The Article related to sulfonium phenylamino substituted stilbene photoacid generator photoresist, Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes: Photoresists and Radiation-Sensitive Resists and other aspects.Product Details of 53136-21-3
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