On January 7, 2015, Jin, Ming; Xie, Jianchao; Pu, Hongting; Wan, Decheng published a patent.SDS of cas: 53136-21-3 The title of the patent was Fluorene-containing sulfonium-series photoacid generator, and preparing method and its application. And the patent contained the following:
The invention relates to a fluorene-containing sulfonium-series photoacid generator, and preparing method and its application. The photoacid generator has chem. structure (I) or (II), wherein, R1 is H, Me, Et, Pr, Bu, hexyl, octyl, nonyl, or dodecyl; R2 is Me, Et, Pr, Bu, hexyl, octyl, nonyl, or dodecyl; R3 is Me, benzyl, 4-cyano benzyl; R4 is Me, benzyl, pentafluorobenzyl, 4-cyanobenzyl, 4-nitrobenzyl, 4-trifluoromethyl benzyl, or 3,5-di-(trifluoromethyl) benzyl; R5 is trifluoromethanesulfonate, hexafluorophosphate, hexafluoroantimonate, or tetrafluoroborate. The inventive photoacid generator is suitable for photoresist active ingredient from UV region to visible region, such as 313nm, 365nm, 385nm, 405nm, and 425nm. The photoacid generator has the advantages of simple synthesis process, easy purification, and high yield, can be used for preparing high-performance photoresist used in 300-425nm, exhibits 0.3-0.6 of photoproduction acid quantum yield, and has high light excitation efficiency, and high catalytic activity. The experimental process involved the reaction of Benzyl(4-bromophenyl)sulfane(cas: 53136-21-3).SDS of cas: 53136-21-3
The Article related to fluorene sulfonium photoacid generator, Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes: Photoresists and Radiation-Sensitive Resists and other aspects.SDS of cas: 53136-21-3
Referemce:
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