Iwashita, Kenichi;Katoh, Hironobu;Ohta, Yoshihiro;Yokozawa, Tsutomu published 《Photodeprotectable N-alkoxybenzyl aromatic polyamides》. The research results were published in《Polymers (Basel, Switzerland)》 in 2017.Quality Control of 3-(4-Aminophenoxy)aniline The article conveys some information:
N-alkoxybenzyl aromatic polyamides were synthesized by polycondensation of N-alkoxybenzyl aromatic diamine with equimolar dicarboxylic acid chloride in the presence of 2.2 equivalent of pyridine at room temperature for 2 days. The obtained polyamides were mainly cyclic polymers, as determined by means of matrix-assisted laser desorption ionization time-of-flight (MALDI-TOF) mass spectrometry, and showed higher solubility in organic solvents than unprotected aromatic polyamides. Photodeprotection of N-alkoxybenzyl aromatic polyamide film containing photo acid generator (PAG) proceeded well under UV irradiation (5 J/cm2), followed by heating at 130 °C for 15 min. The nature of the polymer end groups of N-alkoxybenzyl aromatic polyamides was found to be crucial for photodeprotection reactivity. These polymers are promising candidates for photosensitive heat-resistant materials for fine Cu wiring formation by electroless Cu plating of high-d. semiconductor packaging substrates. To complete the study, the researchers used 3-(4-Aminophenoxy)aniline (cas: 2657-87-6) .
3-(4-Aminophenoxy)aniline is one of ethers-buliding-blocks. Ethers feature bent C–O–C linkages. In dimethyl ether, the bond angle is 111° and C–O distances are 141 pm. The barrier to rotation about the C–O bonds is low. Quality Control of 3-(4-Aminophenoxy)aniline The bonding of oxygen in ethers, alcohols, and water is similar. In the language of valence bond theory, the hybridization at oxygen is sp3.
Reference:
Ether – Wikipedia,
Ether | (C2H5)2O – PubChem