Hu, Shengwen team published research on Chemical Research in Chinese Universities in | 122775-35-3

Safety of 3,4-Dimethoxyphenylboronic acid, 3,4-Dimethoxyphenylboronic acid is a useful research compound. Its molecular formula is C8H11BO4 and its molecular weight is 181.98 g/mol. The purity is usually 95%.
3,4-Dimethoxyphenylboronic acid contains varying amounts of anhydride.
3,4-Dimethoxyphenylboronic acid is a bacterial mutagen. A useful intermediate for organic synthesis.
3,4-Dimethoxyphenylboronic acid is a boronate ester that has been shown to be an effective coupling partner for the Suzuki reaction. It has also been used in cancer therapy and as a photochemical probe for the study of biological properties. 3,4-Dimethoxyphenylboronic acid has been shown to demethylate DNA and inhibit methionine aminopeptidase activity. It also cross-couples with halides, such as chlorides or iodides, and activates tertiary alcohols. 3,4-Dimethoxyphenylboronic acid is soluble in organic solvents and can be used in supramolecular chemistry., 122775-35-3.

Ethers can again be classified into two varieties: if the alkyl or aryl groups are the same on both sides of the oxygen atom, 122775-35-3, formula is C8H11BO4, Name is 3,4-Dimethoxyphenylboronic acid. Then it is a simple or symmetrical ether, whereas if they are different, the ethers are called mixed or unsymmetrical ethers. Safety of 3,4-Dimethoxyphenylboronic acid.

Hu, Shengwen;Chen, Jinping;Yu, Tianjun;Zeng, Yi;Yang, Guoqiang;Li, Yi research published 《 Chemically Amplified Resist Based on Dendritic Molecular Glass for Electron Beam Lithography》, the research content is summarized as follows. A novel dendritic mol. glass(MG) containing adamantane core(AD-15) was synthesized and characterized. It exhibits good solubility in common organic solvents and a stable amorphous state at room temperature, which contributes to forming films with different thicknesses by spin-coating. The thermal anal. of AD-15 indicates that no apparent glass transition temperature(Tg) is observed before the thermal decomposition temperature(Td=160 °C). The good thermal resistance suggests that it can satisfy the lithog. process and is a candidate for photoresist materials. The patterning properties of AD-15 resist were evaluated by electron beam lithog.(EBL). By optimizing the lithog. process parameters, AD-15 resist can achieve 40 nm half-pitch patterns with a line-edge roughness of 4.0 nm. The contrast and sensitivity of AD-15 resist were 1.9 and 67 μC/cm2, resp. Compared with the com. PMMA(950k) electron beam resist, the sensitivity of AD-15 resist increases by 6 times. This study provides a new example of mol. glass resist with high resolution and sensitivity for EBL.

Safety of 3,4-Dimethoxyphenylboronic acid, 3,4-Dimethoxyphenylboronic acid is a useful research compound. Its molecular formula is C8H11BO4 and its molecular weight is 181.98 g/mol. The purity is usually 95%.
3,4-Dimethoxyphenylboronic acid contains varying amounts of anhydride.
3,4-Dimethoxyphenylboronic acid is a bacterial mutagen. A useful intermediate for organic synthesis.
3,4-Dimethoxyphenylboronic acid is a boronate ester that has been shown to be an effective coupling partner for the Suzuki reaction. It has also been used in cancer therapy and as a photochemical probe for the study of biological properties. 3,4-Dimethoxyphenylboronic acid has been shown to demethylate DNA and inhibit methionine aminopeptidase activity. It also cross-couples with halides, such as chlorides or iodides, and activates tertiary alcohols. 3,4-Dimethoxyphenylboronic acid is soluble in organic solvents and can be used in supramolecular chemistry., 122775-35-3.

Referemce:
Ether – Wikipedia,
Ether | (C2H5)2O – PubChem